Adisyn Ltd (ASX: AI1) has announced a notable technical achievement in its pursuit of scalable graphene-based solutions for the semiconductor sector. Through its wholly owned subsidiary, 2D Generation (2DG), the company has successfully validated a critical sub-process within the pre-clean stage of its proprietary low-temperature graphene deposition process - a necessary step before graphene growth on semiconductor wafers can occur.
This milestone confirms that Adisyn’s deposition architecture is performing in line with design expectations and will now progress to broader deposition trials.
According to Chairman Kevin Crofton, “Validating this key sub-process within our pre-clean stage is a meaningful technical advancement and a strong indicator that our low-temperature approach will work as designed.”
The company’s objective is to enable direct graphene growth on semiconductor wafers - a long-standing challenge in the industry - without resorting to the ultra-high temperatures (900–1000°C) typically required in conventional graphene growth methods.
Modern semiconductor performance at advanced nodes, particularly below 5nm, is increasingly constrained by the physical limitations of copper interconnects. These components are responsible for carrying electrical signals between transistors on a chip, but as features shrink, copper's resistance, thermal inefficiency, and susceptibility to electromigration present critical obstacles to further miniaturisation and energy efficiency.
Graphene, a two-dimensional form of carbon with exceptional electrical, thermal, and mechanical properties, has long been considered a potential replacement. However, its adoption has been hindered by integration challenges, particularly the need for high-temperature chemical vapour deposition methods incompatible with standard semiconductor processes.
Adisyn’s approach - based on a patented Atomic Layer Deposition (ALD) technique - seeks to overcome this barrier by enabling low-temperature, scalable graphene growth. This process is designed to integrate seamlessly with existing semiconductor fabrication infrastructure.
The recently validated sub-process involves a surface pre-clean protocol that ensures wafers are free from residual contaminants and chemically prepared for graphene deposition. The company will now commence extensive deposition trials using various carbon-ring-based precursors. Concurrently, it will refine remaining sub-processes, optimise deposition parameters (such as plasma power and gas flow), and characterise resulting films for crystalline quality and conductivity.
Adisyn ALD Machine
This experimental program is expected to run into 2026, aligned with the company’s previously disclosed development roadmap.
Adisyn is leveraging a broad network of international collaborators to accelerate development. These include Tel Aviv University’s Nano Centre - providing access to a second ALD machine - and imec, Belgium’s pre-eminent semiconductor R&D hub, which is conducting simulations and physical validation testing. The company is also engaged with the European Union’s Connecting Chips Initiative, a platform that links Adisyn with industry leaders such as NVIDIA, NXP, Valeo, and Applied Materials.
Adisyn’s R&D efforts are supported by a multi-disciplinary team of over 20 professionals across Israel, the United States, and Europe, with deep expertise in deposition chemistry, nanomaterials, process engineering, and device integration.

Arye Kohavi and Kevin Crofton
The leadership team includes Chairman Kevin Crofton, former CEO of Comet AG and SPTS Technologies; Arye Kohavi, CEO of 2D Generation and founder of Water-Gen; and Miri Kish Dagan, VP of R&D, a veteran technologist in semiconductor and laser systems.
As at mid-October 2025, Adisyn’s market capitalisation stood at approximately $46 million, with $7 million in cash reported as of 30 June 2025. While the company remains in a pre-revenue development phase, the potential commercial applications of its technology span several high-growth sectors including AI, telecommunications, high-performance computing, and autonomous systems.
The successful development of a scalable, low-temperature graphene deposition process would represent a substantial breakthrough in semiconductor manufacturing and could position Adisyn as a first mover in an emerging materials segment. The company expects to provide further updates as it progresses through subsequent development phases, including wafer-level deposition and precursor performance optimisation.
While commercialisation remains a medium-term goal, the validation of this early-stage process architecture provides a solid foundation for continued advancement and industry engagement.